DocumentCode :
2787397
Title :
1.57 µm passively mode-locked wafer-fused semiconductor disk laser
Author :
Saarinen, E.J. ; Lyytikainen, J. ; Rautiainen, J. ; Korpijarvi, V.-M. ; Sirbu, A. ; Mereuta, A. ; Caliman, A. ; Kapon, E. ; Okhotnikov, O.G.
Author_Institution :
Optoelectron. Res. Centre, Tampere Univ. of Technol., Tampere, Finland
fYear :
2009
fDate :
14-19 June 2009
Firstpage :
1
Lastpage :
1
Abstract :
Semiconductor disk lasers (SDLs) operating around 1.55 mum have been the subject of increasing interest. The performance of monolithically grown SDLs in this wavelength range suffers, however, from the poor quality of the InP-based distributed Bragg reflector (DBR). Recently, wafer fusion technique was applied to a long- wavelength SDL to avoid this obstacle. An active region grown on InP substrate was wafer fused to a GaAs/AlGaAs-based DBR resulting in a device operating at 1.57 mum with 2.6 W average output power and a near diffraction limited beam. Here we present the first mode-locked SDL using a wafer-fused gain reflector.
Keywords :
III-V semiconductors; aluminium compounds; distributed Bragg reflectors; gallium arsenide; indium compounds; laser beams; laser mode locking; semiconductor lasers; GaAs-AlGaAs; InP; diffraction limited beam; distributed Bragg reflector; passively mode-locked laser; power 2.6 W; wafer-fused gain reflector; wafer-fused semiconductor disk laser; Gallium arsenide; Indium phosphide; Laser mode locking; Mirrors; Molecular beam epitaxial growth; Optical pulses; Optical pumping; Semiconductor lasers; Substrates; Wafer bonding;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
Conference_Location :
Munich
Print_ISBN :
978-1-4244-4079-5
Electronic_ISBN :
978-1-4244-4080-1
Type :
conf
DOI :
10.1109/CLEOE-EQEC.2009.5192151
Filename :
5192151
Link To Document :
بازگشت