Principles of femtosecond pulse tailoring for advanced material processing

Author

Wollenhaupt, M. ; Englert, L. ; Sarpe-Tudoran, C. ; Baumert, T.

Author_Institution

Inst. fur Phys. und CINSaT, Univ. Kassel, Kassel, Germany

fYear

2009

fDate

14-19 June 2009

Firstpage

1

Lastpage

1

Abstract

Control of ionization processes with tailored femtosecond pulses is an important prerequisite for robust control of laser processing of high band gap materials. We make use of temporally asymmetric femtosecond pulses of identical fluence and identical pulse duration in order to control photo-ionization and electron-electron impact ionization. This results in observed different thresholds for material modification in fused silica as well as in reproducible lateral structures. Our strategy opens the route to develop tailored pulse shapes for controlled nanoscale material processing of dielectrics.

Keywords

dielectric materials; high-speed optical techniques; impact ionisation; laser materials processing; optical control; optical materials; photoionisation; photonic band gap; robust control; silicon compounds; controlled nanoscale dielectric material processing; electron-electron impact ionization; femtosecond pulse tailoring; fused silica material modification; ionization process control; laser high-band gap material processing; photo-ionization control; robust control; temporally asymmetric femtosecond pulse; Dielectric materials; Impact ionization; Materials processing; Optical control; Optical materials; Optical pulses; Photonic band gap; Process control; Robust control; Shape control;

fLanguage

English

Publisher

ieee

Conference_Titel

Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on

Conference_Location

Munich

Print_ISBN

978-1-4244-4079-5

Electronic_ISBN

978-1-4244-4080-1

Type

conf

DOI

10.1109/CLEOE-EQEC.2009.5192210

Filename

5192210