Diffusion of Ag dimer on Cu (110) by dissociation-reassociation and concerted jump processes

Author

Sbiaai, K. ; Boughaleb, Y. ; Raty, J.-Y. ; Hajjaji, A. ; Arabaoui, A. ; Kara, A. ; Sahraoui, B.

Author_Institution

Lab. de la Phys. de la Mater. Condensee, Univ. Chouaib Doukkali, El Jadida, Morocco

fYear

2012

fDate

2-5 July 2012

Firstpage

1

Lastpage

3

Abstract

In this work we investigate the diffusion of Ag dimer on Cu(110) surface by molecular dynamics simulation based on semi-empirical many-body potentials derived from the embedded atom method. The dissociation-reassociation process is predicted to be dominant in static regime and this is confirmed by the dynamic investigation. A good agreement is found between static activation barrier and dynamic potential barrier.

Keywords

association; diffusion; dissociation; many-body problems; molecular dynamics method; silver; surface diffusion; Ag; Ag dimer diffusion; Cu; Cu(110) surface; concerted jump processes; dissociation-reassociation process; dynamic potential barrier; embedded atom method; molecular dynamics simulation; semiempirical many-body potentials; static activation barrier; Atomic layer deposition; Diffusion processes; Educational institutions; Electronic mail; Metals; Surface morphology; Surface treatment; binding energy; concerted jump; dissociation and reassociation; surface diffusion;

fLanguage

English

Publisher

ieee

Conference_Titel

Transparent Optical Networks (ICTON), 2012 14th International Conference on

Conference_Location

Coventry

ISSN

2161-2056

Print_ISBN

978-1-4673-2228-7

Electronic_ISBN

2161-2056

Type

conf

DOI

10.1109/ICTON.2012.6253824

Filename

6253824