Title :
Characterization of laser-induced air plasmas and thin films using third harmonic generation microscopy
Author :
Rodríguez, Cristina ; Weber, Reed A. ; Nguyen, Duy N. ; Emmert, Luke A. ; Rudolph, Wolfgang
Author_Institution :
Dept. of Phys. & Astron., Univ. of New Mexico, Albuquerque, NM, USA
Abstract :
Third harmonic microscopy is applied to probe electron densities in femtosecond laser-induced air plasmas, determine nonlinear susceptibilities of thin films, and image nascent, laser incubated, and laser damaged dielectric coatings with unprecedented contrast. The relative contribution of signals from the layer of interest and its surroundings is analyzed.
Keywords :
electron density; harmonic generation; high-speed optical techniques; plasma diagnostics; plasma dielectric properties; plasma light propagation; plasma nonlinear processes; femtosecond laser-induced air plasmas; image nascent dielectric coatings; laser damaged dielectric coatings; laser incubated dielectric coatings; nonlinear susceptibilities; probe electron densities; thin films; third harmonic generation microscopy; Films; Laser beams; Microscopy; Plasmas; Probes; Substrates; damage precursors; femtosecond phenomena; nonlinear microscopy; optical materials; plasma diagnostics; third harmonic;
Conference_Titel :
Transparent Optical Networks (ICTON), 2012 14th International Conference on
Conference_Location :
Coventry
Print_ISBN :
978-1-4673-2228-7
Electronic_ISBN :
2161-2056
DOI :
10.1109/ICTON.2012.6253856
