DocumentCode
2789836
Title
Selective micrometer hole morphology shaped by an ultrashort laser
Author
Utéza, O. ; Sanner, N. ; Chimier, B. ; Sentis, M. ; Lassonde, P. ; Légaré, F. ; Kieffer, J.C.
Author_Institution
Lab. LP3, Univ. de la Mediterranee, Marseille, France
fYear
2009
fDate
14-19 June 2009
Firstpage
1
Lastpage
1
Abstract
In this paper, we show that selective crater morphology, top-hat to Gaussian-like ~ 10 mum crater, can be obtained with an ultrafast laser system without any additional spatial shaping system (as a consequence, without any supplementary cost and complexity), only by varying the applied intensity on the material. The experiments are performed in single shot regime and for two pulse durations (7 and 28 fs experiments).
Keywords
high-speed optical techniques; laser materials processing; selective crater morphology; selective micrometer hole morphology shaping; spatial shaping system; time 28 fs; time 7 fs; ultrashort laser; Dielectric materials; Laser ablation; Laser modes; Micromachining; Morphology; Optical materials; Optical pulse shaping; Optical pulses; Plasmas; Pulsed laser deposition;
fLanguage
English
Publisher
ieee
Conference_Titel
Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
Conference_Location
Munich
Print_ISBN
978-1-4244-4079-5
Electronic_ISBN
978-1-4244-4080-1
Type
conf
DOI
10.1109/CLEOE-EQEC.2009.5192283
Filename
5192283
Link To Document