Title :
Statistical process characterization in advanced analog IC manufacturing
Author :
Carlson, Arvid C. ; Sundaram, Sam L.
Author_Institution :
Motorola Inc., Mesa, AZ, USA
Abstract :
The device parameter drift of a JFET operational amplifier is discussed in terms of yield loss and product quality of analog ICs. Planned statistical experimentation was used to identify process factors that were causing drift. The improvements obtained using statistical process characterization and the resultant analog IC yield enhancement are described. The scenario presented demonstrates the essential need for a statistical approach to solve complex IC manufacturing problems. The multidisciplinary approach involves statistics, device physics, process characterization, device characterization, and manufacturing
Keywords :
analogue circuits; integrated circuit manufacture; operational amplifiers; quality control; statistical process control; JFET operational amplifier; advanced analog IC manufacturing; device characterization; device parameter drift; multidisciplinary approach; product quality; statistical experimentation; statistical process characterization; yield loss; Analog integrated circuits; Automatic testing; Circuit testing; JFET circuits; Manufacturing processes; Operational amplifiers; Packaging; Process control; System testing; Time measurement;
Conference_Titel :
Electronic Manufacturing Technology Symposium, 1990 Proceedings, Competitive Manufacturing for the Next Decade. IEMT Symposium, Ninth IEEE/CHMT International
Conference_Location :
Washington, DC
DOI :
10.1109/IEMT9.1990.114995
