Title :
Measuring the deterministic character of laser damage of dielectrics in ultrashort pulsed regime
Author :
Sanner, N. ; Utéza, O. ; Sentis, M. ; Lassonde, P. ; Légaré, F. ; Kieffer, J.E.
Author_Institution :
Lab. LP3, Univ. de la Mediterranee, Marseille, France
Abstract :
In this work, the authors propose a direct and quantitative measurement of the deterministic character of femtosecond laser-induced damage in fused silica. For pulses ranging from 7 fs to 450 fs, and with combined experimental procedures enabling to measure both the laser-induced damage and ablation thresholds, the paper presents an experimental measurement of the determinism strength for material damaging, corresponding to the transition slope of the damage probability curve as a function of laser fluence. All the experiments have been done on fused silica (Suprasil) and with a similar damage setup and diagnostics, and beam parameters (single-shot regime, beam waist ~5-10 mum, linear polarization) to ensure a reliable comparison. The results indicate that the laser damage occurrence is more deterministic below 30 fs, associated with a better "photon efficiency" for material removal . These investigations also provide a physical insight and control over important laser processes parameters like damage/ablation threshold fluence, crater shape, and extension of heat-affected zone.
Keywords :
dielectric materials; high-speed optical techniques; laser ablation; laser beam effects; silicon compounds; SiO2; Suprasil; damage probability; dielectric materials; laser ablation threshold; laser damage; laser induced damage; linear polarization; material removal; time 7 fs to 450 fs; ultrashort pulsed regime; Dielectric measurements; Laser ablation; Laser beams; Laser theory; Laser transitions; Optical materials; Optical pulses; Pulse measurements; Shape control; Silicon compounds;
Conference_Titel :
Lasers and Electro-Optics 2009 and the European Quantum Electronics Conference. CLEO Europe - EQEC 2009. European Conference on
Conference_Location :
Munich
Print_ISBN :
978-1-4244-4079-5
Electronic_ISBN :
978-1-4244-4080-1
DOI :
10.1109/CLEOE-EQEC.2009.5192328