Title :
CMOS Compatible SOI MESFETs for Extreme Environment Applications
Author :
Vandersand, James ; Kushner, Vadim ; Yang, Jinman ; Blalock, Benjamin ; Thornton, Trevor
Author_Institution :
Dept. of Electr. & Comput. Eng., Tennessee Univ., Knoxville, TN
Abstract :
Silicon-on-insulator MESFETs have been manufactured using a commercial SOI CMOS process and their electrical characteristics measured from room temperature up to 200deg C. No modifications were made to the CMOS process flow. The prototype devices use a CoSi2 gate material and the gate current follows the expected Shottky diode behavior. At room temperature a 0.6 mum gate length device has a threshold voltage of -0.8 V with an off-state drain current of approximately 5 nA. The device shows an attractive family of I-V curves up to 200deg C. For higher temperatures the reverse diode current makes it hard to switch the device off. Numerical simulations of a similar device with a higher barrier height PtSi gate show reasonable behavior up to 300degC
Keywords :
Schottky gate field effect transistors; cobalt compounds; platinum compounds; semiconductor device manufacture; silicon-on-insulator; -0.8 V; 0.6 micron; CoSi2; PtSi; SOI CMOS process; SOI MESFET; Shottky diode behavior; barrier height; gate material; reverse diode current; switching; CMOS process; Diodes; Electric variables; Electric variables measurement; Fluid flow measurement; MESFETs; Manufacturing processes; Silicon on insulator technology; Switches; Temperature measurement;
Conference_Titel :
Aerospace Conference, 2005 IEEE
Conference_Location :
Big Sky, MT
Print_ISBN :
0-7803-8870-4
DOI :
10.1109/AERO.2005.1559564