• DocumentCode
    2792100
  • Title

    Epitaxial liftoff as a method-of manufacturing large area crystalline silicon transistor arrays for AMLCD´s

  • Author

    Sickmiller, M. ; Yablonovitch, E.

  • Author_Institution
    UCLA Electrical Engineering Department, Los Angeles, CA
  • fYear
    1995
  • fDate
    7-9 Aug. 1995
  • Firstpage
    5
  • Lastpage
    6
  • Abstract
    Crystalline silicon transistors offer better performance and higher speeds than amorphous or poly-silicon transistors. This leads to higher resolution, larger displays, and better performance of the AMLCD. Using pre-fabricated crystalline silicon devices allows for the advantage of more complex circuit design within the pixel such as the incorporation of storage capacitors, or multi-device circuits at each pixel. This technique also offers a simplified, lower cost alternative to present production processes.
  • Keywords
    Active matrix liquid crystal displays; Crystallization; Etching; Foundries; Glass; Manufacturing; Silicon on insulator technology; Substrates; Thin film transistors; Wafer bonding;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Flat Panel Display Technology/Technologies for a Global Information Infrastructure/ICs for New Age Lightwave Communications/RF Optoelectronics, 1995 Digest of the LEOS Summer Topical Meetings
  • Conference_Location
    Keystone, CO, USA
  • Print_ISBN
    0-7803-2448-X
  • Type

    conf

  • DOI
    10.1109/LEOSST.1995.763973
  • Filename
    763973