A bulk-micromachined silicon micromirror for tunable optical switch applications

Author

Seo, Kyoung-Sun ; Cho, Young-Ho ; Youn, Sung-Kie

Author_Institution

Dept. of Mech. Eng., Korea Adv. Inst. of Sci. & Technol., Taejon, South Korea

Volume

2

fYear

1996

fDate

18-21 Nov 1996

Firstpage

404

Abstract

A bulk-micromachined electrostatic micromirror has been presented for tunable optical switching devices. A silicon micromirror with (111) crystalline planes has been fabricated. It measures 1000 μm×400 μm×90 μm. The optical switching function has been obtained by an electrostatic drive of the micromirror in the direction parallel to the substrate. In a static performance test, stable deflection of the micromirror has been observed up to the threshold deflection of 26.5 μm with the threshold voltage of 330 V. In a dynamic test, the resonant switching frequency has been measured as 590 kHz. For the DC bias voltage range of 50-300 V with an AC drive voltage of 10 V, a continuous reduction of the resonant switching frequency has been demonstrated with the maximum frequency reduction of 23.7%

Keywords

electro-optical switches; electrostatic devices; micromachining; micromechanical devices; mirrors; optical fabrication; optical testing; (111) crystalline planes; 1 mm; 10 V; 26.5 mum; 330 V; 400 mum; 50 to 300 V; 590 kHz; 90 mum; AC drive voltage; DC bias voltage; bulk-micromachined silicon micromirror; electrostatic micromirror; resonant switching frequency reduction; stable deflection; static performance test; tunable optical switch; Crystallization; Electrostatic measurements; Micromirrors; Optical devices; Optical switches; Resonance; Silicon; Switching frequency; Testing; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Emerging Technologies and Factory Automation, 1996. EFTA '96. Proceedings., 1996 IEEE Conference on

Conference_Location

Kauai, HI

Print_ISBN

0-7803-3685-2

Type

conf

DOI

10.1109/ETFA.1996.573626

Filename

573626