DocumentCode
2794134
Title
Unique Challenges and Solutions in CMOS Compatible NVM
Author
Bu, Jiankang ; Belcher, William ; Parker, Courtney ; Prosack, Hank
Author_Institution
Adv. Process Technol. Dev., Nat. Semicond., South Portland, ME
fYear
2006
fDate
5-8 Nov. 2006
Firstpage
52
Lastpage
54
Abstract
CMOS compatible NVM is finding increasing applications that range from a few bits in analog trim applications to kilobits for data or code. CMOS compatibility comes with unique retention and endurance challenges. The floating gate is in direct contact with backend dielectric, which degrades high temperature data retention performance. Drain and well doping profile are not optimized to favor hot carrier generation and injection. Endurance is poor due to serious oxide damage. Mechanisms and preferred solutions are described. Experiment results match theoretical analysis.
Keywords
CMOS memory circuits; doping profiles; hot carriers; tunnelling; CMOS compatible NVM; carrier injection; doping profile; drain avalanche hot carrier; floating gate; high temperature data retention performance; hot carrier generation; serious oxide damage; trap-asssited-tunneling; CMOS process; CMOS technology; Costs; Dielectrics; Doping profiles; Hot carriers; MOSFETs; Nonvolatile memory; System-on-a-chip; Temperature; CMOS compatible; Drain Avalanche Hot Carrier; NVM; Trap-Asssited-Tunneling; endurance; oxynitride;
fLanguage
English
Publisher
ieee
Conference_Titel
Non-Volatile Memory Technology Symposium, 2006. NVMTS 2006. 7th Annual
Conference_Location
San Mateo, CA
Print_ISBN
0-7803-9738-X
Type
conf
DOI
10.1109/NVMT.2006.378876
Filename
4228435
Link To Document