• DocumentCode
    2794134
  • Title

    Unique Challenges and Solutions in CMOS Compatible NVM

  • Author

    Bu, Jiankang ; Belcher, William ; Parker, Courtney ; Prosack, Hank

  • Author_Institution
    Adv. Process Technol. Dev., Nat. Semicond., South Portland, ME
  • fYear
    2006
  • fDate
    5-8 Nov. 2006
  • Firstpage
    52
  • Lastpage
    54
  • Abstract
    CMOS compatible NVM is finding increasing applications that range from a few bits in analog trim applications to kilobits for data or code. CMOS compatibility comes with unique retention and endurance challenges. The floating gate is in direct contact with backend dielectric, which degrades high temperature data retention performance. Drain and well doping profile are not optimized to favor hot carrier generation and injection. Endurance is poor due to serious oxide damage. Mechanisms and preferred solutions are described. Experiment results match theoretical analysis.
  • Keywords
    CMOS memory circuits; doping profiles; hot carriers; tunnelling; CMOS compatible NVM; carrier injection; doping profile; drain avalanche hot carrier; floating gate; high temperature data retention performance; hot carrier generation; serious oxide damage; trap-asssited-tunneling; CMOS process; CMOS technology; Costs; Dielectrics; Doping profiles; Hot carriers; MOSFETs; Nonvolatile memory; System-on-a-chip; Temperature; CMOS compatible; Drain Avalanche Hot Carrier; NVM; Trap-Asssited-Tunneling; endurance; oxynitride;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Non-Volatile Memory Technology Symposium, 2006. NVMTS 2006. 7th Annual
  • Conference_Location
    San Mateo, CA
  • Print_ISBN
    0-7803-9738-X
  • Type

    conf

  • DOI
    10.1109/NVMT.2006.378876
  • Filename
    4228435