Title :
Functional plasma-polymerized thin films prepared by a new type of reactor
Author :
Morita, Shinzo ; Naganawa, Tsuyoshi ; Kim, Jong-Taek ; Lee, Duck-Chool ; Vinogradov, Georgy K.
Author_Institution :
Nagoya Univ., Japan
Abstract :
A novel gas-flow type reactor for plasma polymerization was developed to synthesize functional polymers which enhance the reaction of radicals activated in the discharge. Styrene was used for the polymerization. The molecular structure and the molecular weight distribution were studied. The polymer was evaluated as an electron beam resist. The sensitivity of the film formed by the new reactor was higher than the reported values and a fine pattern was successfully developed in the resist by a wet process
Keywords :
electron resists; polymer films; electron beam resist; electron sensitivity; fine pattern; functional polymers; gas-flow type reactor; molecular structure; molecular weight distribution; plasma polymerization; plasma-polymerized thin films; polystyrene; reaction of radicals; wet process; Argon; Electrodes; Electron beams; Inductors; Lithography; Plasma chemistry; Plasma x-ray sources; Polymer films; Resists; Transistors;
Conference_Titel :
Properties and Applications of Dielectric Materials, 1991., Proceedings of the 3rd International Conference on
Conference_Location :
Tokyo
Print_ISBN :
0-87942-568-7
DOI :
10.1109/ICPADM.1991.172144
