Title :
CAFE-the MIT computer aided fabrication environment
Author :
McIlrath, Michael B. ; Troxel, Donald E. ; Boning, Duane S. ; Heytens, Michael L. ; Penfield, Paul, Jr. ; Jayavant, Rajeev
Author_Institution :
Dept. of Electr. Eng. & Comput. Sci., MIT, Cambridge, MA, USA
Abstract :
The computer-aided fabrication environment (CAFE) is a software system being developed at MIT for use in the manufacture of integrated circuits. CAFE is intended to be used in all phases of process design, development, planning, and manufacturing of integrated-circuit wafers. The CAFE architectural framework supports a wide variety of software modules, including both development tools and online applications. The key components of the CAFE architecture are the data model and database schema, the process flow and wafer representations, the user interface, and the application programming and database interfaces. All CAFE application modules store and retrieve persistent data through a common database interface layer. Interface wrappers provide seamless, transparent integration of external tools and packages which have their own internal data formats
Keywords :
decision support systems; development systems; integrated circuit manufacture; manufacturing data processing; software packages; software tools; user interfaces; CAFE; IC manufacture; MIT; application programming; architectural framework; common database interface layer; computer-aided fabrication environment; data formats; data model; database interfaces; database schema; development tools; external tools; integrated-circuit wafers; online applications; packages; planning; process design; process flow; software system; transparent integration; user interface; Application software; Computer aided manufacturing; Computer integrated manufacturing; Databases; Fabrication; Integrated circuit manufacture; Manufacturing processes; Process design; Process planning; Software systems;
Conference_Titel :
Electronic Manufacturing Technology Symposium, 1990 Proceedings, Competitive Manufacturing for the Next Decade. IEMT Symposium, Ninth IEEE/CHMT International
Conference_Location :
Washington, DC
DOI :
10.1109/IEMT9.1990.115022