Title :
Application of mechanical-technology CAD to microelectronic device design and manufacturing
Author :
Maseeh, Fariborz ; Harris, Robert M. ; Boning, Duane S. ; Heytens, Michael L. ; Gelston, Sean A. ; Senturia, Stephen D.
Author_Institution :
Microsyst. Technol. Lab., MIT, Cambridge, MA, USA
Abstract :
A computer-aided-design (CAD) architecture for microelectromechanical systems is presented in which conventional mask layout and process simulation tools are linked to three-dimensional mechanical CAD and finite-element tools for analysis and simulation. The architecture is exercised at an elementary level by modeling the first steps of the MIT baseline CMOS process. An architecture for an object-oriented material property simulator is shown in which material properties and their process dependence are stored and are accessed based on the specific process conditions
Keywords :
CMOS integrated circuits; digital simulation; finite element analysis; masks; mechanical engineering computing; micromechanical devices; MIT baseline CMOS process; finite-element tools; mask layout; material property simulator; mechanical-technology CAD; microelectromechanical systems; microelectronic device design; process simulation tools; Analytical models; Application software; Computational modeling; Computer simulation; Finite element methods; Material properties; Microelectromechanical systems; Microelectronics; Object oriented modeling; Semiconductor device modeling;
Conference_Titel :
Electronic Manufacturing Technology Symposium, 1990 Proceedings, Competitive Manufacturing for the Next Decade. IEMT Symposium, Ninth IEEE/CHMT International
Conference_Location :
Washington, DC
DOI :
10.1109/IEMT9.1990.115030
