DocumentCode
2797366
Title
A new fabrication process for micro optical elements using drie and oxidation
Author
Ohara, Junji ; Kano, Kazuhiko ; Takeuchi, Yukihiro
Author_Institution
Denso Corp., Nisshin
fYear
2007
fDate
21-25 Jan. 2007
Firstpage
279
Lastpage
282
Abstract
We have developed a new fabrication process of micro optical elements by applying DRIE (Deep Reactive Ion Etching) process and thermal oxidation, which enables us to make micro lenses and prisms on a silicon substrate without assembling. This process can also form other optical elements, such as light wave-guides by changing mask pattern.
Keywords
masks; microlenses; optical fabrication; optical prisms; optical waveguides; oxidation; silicon; sputter etching; DRIE; deep reactive ion etching; fabrication process; light wave-guides; mask pattern; micro lenses; micro optical elements; oxidation; prisms; silicon substrate; thermal oxidation; Etching; Lenses; Optical arrays; Optical device fabrication; Optical devices; Optical films; Oxidation; Semiconductor laser arrays; Silicon compounds; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Micro Electro Mechanical Systems, 2007. MEMS. IEEE 20th International Conference on
Conference_Location
Hyogo
ISSN
1084-6999
Print_ISBN
978-1-4244-095-5
Electronic_ISBN
1084-6999
Type
conf
DOI
10.1109/MEMSYS.2007.4432968
Filename
4432968
Link To Document