• DocumentCode
    2797809
  • Title

    Three dimensional dielectrophoretic assembly of singlewalled carbon nanotubes for integrated circuit interconnects

  • Author

    Khanduja, Nishant ; Selvarasah, Selvapraba ; Makaram, Prashanth ; Chen, Chia-Ling ; Busnaina, Ahmed ; Dokmeci, Mehmet R.

  • Author_Institution
    Northeastern Univ., Boston
  • fYear
    2007
  • fDate
    21-25 Jan. 2007
  • Firstpage
    823
  • Lastpage
    826
  • Abstract
    In this paper, we report a novel technological approach for three dimensional (3D) assembly of single-walled carbon nanotubes (SWNTs) using dielectrophoresis (DEP). The two terminal resistance of the assembled SWNTs is ~545 Ohms. Encapsulation of the 3D structure with a thin layer of parylene-C protects it from the environment and keeps it intact. This directed assembly procedure is versatile, inexpensive, and achieved at room temperature. By utilizing a self-aligned three mask process, we demonstrate a 3D assembly/encapsulation method utilizing conductive SWNTs as the metallization material, parylene-C as the inter-level dielectric and the encapsulation layer. This technology is also applicable for vertical assembly of other conductive nanostructures and will enable 3D research in nanotechnology.
  • Keywords
    carbon nanotubes; dielectric materials; electrophoresis; integrated circuit interconnections; nanotechnology; 3D structure encapsulation; DEP; SWNT; conductive nanostructures; dielectrophoresis; integrated circuit interconnects; interlevel dielectric; nanotechnology; parylene-C protects; self-aligned three mask process; single-walled carbon nanotube; three dimensional dielectrophoretic assembly; Assembly; Carbon nanotubes; Conducting materials; Dielectrophoresis; Encapsulation; Integrated circuit interconnections; Integrated circuit technology; Metallization; Protection; Temperature;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Micro Electro Mechanical Systems, 2007. MEMS. IEEE 20th International Conference on
  • Conference_Location
    Hyogo
  • ISSN
    1084-6999
  • Print_ISBN
    978-1-4244-095-5
  • Electronic_ISBN
    1084-6999
  • Type

    conf

  • DOI
    10.1109/MEMSYS.2007.4433002
  • Filename
    4433002