Title :
Three dimensional dielectrophoretic assembly of singlewalled carbon nanotubes for integrated circuit interconnects
Author :
Khanduja, Nishant ; Selvarasah, Selvapraba ; Makaram, Prashanth ; Chen, Chia-Ling ; Busnaina, Ahmed ; Dokmeci, Mehmet R.
Author_Institution :
Northeastern Univ., Boston
Abstract :
In this paper, we report a novel technological approach for three dimensional (3D) assembly of single-walled carbon nanotubes (SWNTs) using dielectrophoresis (DEP). The two terminal resistance of the assembled SWNTs is ~545 Ohms. Encapsulation of the 3D structure with a thin layer of parylene-C protects it from the environment and keeps it intact. This directed assembly procedure is versatile, inexpensive, and achieved at room temperature. By utilizing a self-aligned three mask process, we demonstrate a 3D assembly/encapsulation method utilizing conductive SWNTs as the metallization material, parylene-C as the inter-level dielectric and the encapsulation layer. This technology is also applicable for vertical assembly of other conductive nanostructures and will enable 3D research in nanotechnology.
Keywords :
carbon nanotubes; dielectric materials; electrophoresis; integrated circuit interconnections; nanotechnology; 3D structure encapsulation; DEP; SWNT; conductive nanostructures; dielectrophoresis; integrated circuit interconnects; interlevel dielectric; nanotechnology; parylene-C protects; self-aligned three mask process; single-walled carbon nanotube; three dimensional dielectrophoretic assembly; Assembly; Carbon nanotubes; Conducting materials; Dielectrophoresis; Encapsulation; Integrated circuit interconnections; Integrated circuit technology; Metallization; Protection; Temperature;
Conference_Titel :
Micro Electro Mechanical Systems, 2007. MEMS. IEEE 20th International Conference on
Conference_Location :
Hyogo
Print_ISBN :
978-1-4244-095-5
Electronic_ISBN :
1084-6999
DOI :
10.1109/MEMSYS.2007.4433002