DocumentCode
2798674
Title
Degradation of InGaAs-InP heterojunction bipolar transistors under high energy electron irradiation
Author
Bandyopadhyay, A. ; Subramanian, S. ; Chandrasekhar, S. ; Goodnick, S.M.
Author_Institution
Dept. of Electr. & Comput. Eng., Oregon State Univ., Corvallis, OR, USA
fYear
1998
fDate
March 31 1998-April 2 1998
Firstpage
98
Lastpage
102
Abstract
The DC characteristics of InGaAs-InP single heterojunction bipolar transistors (SHBTs) were studied for the first time under high energy (/spl sim/1 MeV) electron radiation with a cumulative dose up to 5.4/spl times/10/sup 15/ electrons/cm/sup 2/. The following degradation effects were observed for electron doses greater than 10/sup 15//cm/sup 2/: (1) decrease in collector current, (2) decrease in current gain by up to 50%, and (3) an increase in collector saturation voltage by 0.2-0.8 V depending on base current. The increase in collector saturation voltage is attributed to an increase in emitter contact resistance after irradiation. The degradation of collector current and current gain are thought to be due to increased recombination caused by radiation-induced defects in the base-emitter junction.
Keywords
III-V semiconductors; contact resistance; electron beam effects; electron-hole recombination; gallium arsenide; heterojunction bipolar transistors; indium compounds; semiconductor device reliability; semiconductor device testing; 0.2 to 0.8 V; 1 MeV; DC characteristics; InGaAs-InP; InGaAs-InP HBT degradation; InGaAs-InP heterojunction bipolar transistors; InGaAs-InP single heterojunction bipolar transistors; base current; base-emitter junction defects; collector current; collector saturation voltage; current gain; electron degradation effects; electron dose; electron radiation cumulative dose; emitter contact resistance; high energy electron irradiation; radiation-induced defects; recombination; Degradation; Electrons; Heterojunction bipolar transistors; Indium gallium arsenide; Indium phosphide; Laboratories; Neutrons; Radiative recombination; Silicon; Substrates;
fLanguage
English
Publisher
ieee
Conference_Titel
Reliability Physics Symposium Proceedings, 1998. 36th Annual. 1998 IEEE International
Conference_Location
Reno, NV, USA
Print_ISBN
0-7803-4400-6
Type
conf
DOI
10.1109/RELPHY.1998.670453
Filename
670453
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