• DocumentCode
    2800944
  • Title

    Analysis of strained-Si device including quantum effect

  • Author

    Tanabe, R. ; Yamasaki, T. ; Ashizawa, Y. ; Oka, H.

  • Author_Institution
    Fujitsu Labs. Ltd., Tokyo, Japan
  • fYear
    2004
  • fDate
    24-27 Oct. 2004
  • Firstpage
    80
  • Lastpage
    81
  • Abstract
    Strained-Si technologies are actively discussed from both sides of experiments and simulations in recent years as stated in K. Rim et al. (2003) and F. M. Bufler (2003), and with progressive technology scaling, quantum transport also becomes important increasingly. The authors linked the first principle band calculation program to the FUJITSU ensemble full band Monte Carlo simulator FALCON directly, which enables to take in arbitrary biaxial strained-Si band structure easily. And also the quantum effect was implemented by Bohm potential method as stated in B. Wu et al. (2003). The strained-Si device including quantum effect was examined. The strain effect decreases with scaling to l0nm gate length regime. However, in the domain which ballistic particle is majority, the effect of strain becomes useful again by the increase of the velocity by strain at the source region. This becomes more remarkable when quantum effect is taken into account.
  • Keywords
    Monte Carlo methods; ballistic transport; elemental semiconductors; silicon; Bohm potential method; FALCON; FUJITSU; Monte Carlo simulator; ballistic particle; band calculation program; gate length; quantum effect; quantum transport; strain effect decreases; strained-Si device; technology scaling; Monte Carlo methods; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Computational Electronics, 2004. IWCE-10 2004. Abstracts. 10th International Workshop on
  • Conference_Location
    West Lafayette, IN, USA
  • Print_ISBN
    0-7803-8649-3
  • Type

    conf

  • DOI
    10.1109/IWCE.2004.1407333
  • Filename
    1407333