DocumentCode :
280123
Title :
Quest for an NDT method to detect marginal ESD damage to ICs
Author :
Yates, R.B. ; Edwards, I.M.
Author_Institution :
Sch. of Eng. Inf. Technol., Sheffield City Polytech., UK
fYear :
1990
fDate :
33023
Firstpage :
42461
Lastpage :
42464
Abstract :
The magnitude of the static charge built up in a typical working environment ranges from 100 volts to 20 kV. It this is discharged through an integrated circuit it may result in gate oxide breakdown in MOS devices and short or open circuits in metal tracks leading to device failure. Failure in TTL is due to breakdown of the reverse biased junction as a result of impact ionisation and subsequent Joule heating. To reduce the likelihood of static damage, special handling procedures are followed as prescribed by BS 5783. However the level of protection achieved is at best a function of how rigorously the guidelines are obeyed. A non-destructive test is described to evaluate an integrated circuits´ (IC) exposure to static damage events
Keywords :
electrostatic discharge; failure analysis; integrated circuit testing; nondestructive testing; 100 V to 20 kV; BS 5783; Joule heating; MOS devices; NDT method; TTL; device failure; gate oxide breakdown; handling procedures; impact ionisation; marginal ESD damage; metal tracks; open circuits; reverse biased junction; short circuits; static damage events; working environment;
fLanguage :
English
Publisher :
iet
Conference_Titel :
NDT Evaluation of Electronic Components and Assemblies, IEE Colloquium on
Conference_Location :
London
Type :
conf
Filename :
190282
Link To Document :
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