DocumentCode :
2801376
Title :
Origins of universal mobility violation in SOI MOSFETs
Author :
Rodriguez, N. ; Cristoloveanu, S. ; Gamiz, F.
Author_Institution :
Dept. de Electron., Univ. of Granada, Granada, Spain
fYear :
2010
fDate :
14-16 Sept. 2010
Firstpage :
420
Lastpage :
423
Abstract :
The relation between the effective mobility and the transversal field is systematically investigated for SOI-MOSFETs operated in single-gate and double-gate modes. We point out several practical situations where the Universal Mobility (UM) concept is not applicable. In particular, different carrier distributions can lead to the same value of effective field and to distinct mobility values, breaking the foundations of the UM curve. The presence of two interfaces and channels with different quality or the carrier redistribution within the transistor body cannot be accounted in the UM. In particular cases, very unusual mobility-field curves are obtained.
Keywords :
MOSFET; silicon-on-insulator; SOI MOSFET; distinct mobility values; double-gate modes; mobility-field curves; single-gate modes; universal mobility violation; Electric fields; Electron mobility; Equations; Logic gates; MOSFETs; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference (ESSDERC), 2010 Proceedings of the European
Conference_Location :
Sevilla
ISSN :
1930-8876
Print_ISBN :
978-1-4244-6658-0
Type :
conf
DOI :
10.1109/ESSDERC.2010.5618192
Filename :
5618192
Link To Document :
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