Title :
Remote Hasma Deposited Amorphous Silicon with In-Situ Hydrogen Etching
Author :
Lo, Yoon F. ; Collis, Ward J.
Author_Institution :
Department of Electrical Engineering, North Carolina A&T State University
Keywords :
Amorphous silicon; Etching; Helium; Hydrogen; Plasma applications; Plasma chemistry; Plasma measurements; Plasma temperature; Radio frequency; Semiconductor thin films;
Conference_Titel :
System Theory, 1992. Proceedings. SSST/CSA 92. The 24th Southeastern Symposium on and The 3rd Annual Symposium on Communications, Signal Processing Expert Systems, and ASIC VLSI Design
Print_ISBN :
0-8186-2665-8
DOI :
10.1109/SSST.1992.712190
