DocumentCode :
2801901
Title :
Impact of electron velocity on the ION of n-TFETs
Author :
Virani, Hasanali ; Esseni, David ; Kottantharayil, Anil
Author_Institution :
Indian Inst. of Technol. Bombay, Mumbai, India
fYear :
2010
fDate :
14-16 Sept. 2010
Firstpage :
349
Lastpage :
352
Abstract :
This paper presents a simulation study concerning the impact of the channel transport on the ON current, ION, of n-channel tunnel FETs. We show that, when the tunneling generation rate is enhanced to reach ION values approximately few μA/μm, then the ION becomes sensitive to the electron velocity in the channel. This is because, at large tunneling rates, the charge due to the generated electrons tends to modify the potential in the channel in such a way that limits the generation rate at the source. Such an electrostatic feedback is smaller the larger is the electron velocity, so that higher tunneling rates and ION values are observed when increasing the electron velocity.
Keywords :
field effect transistors; tunnel transistors; ION; ON current; channel transport; electron velocity; electrostatic feedback; n-TFET; n-channel tunnel FET; tunneling generation rate; Electrostatics; Junctions; Logic gates; Semiconductor process modeling; Silicon; Stress; Tunneling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference (ESSDERC), 2010 Proceedings of the European
Conference_Location :
Sevilla
ISSN :
1930-8876
Print_ISBN :
978-1-4244-6658-0
Type :
conf
DOI :
10.1109/ESSDERC.2010.5618219
Filename :
5618219
Link To Document :
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