• DocumentCode
    2801901
  • Title

    Impact of electron velocity on the ION of n-TFETs

  • Author

    Virani, Hasanali ; Esseni, David ; Kottantharayil, Anil

  • Author_Institution
    Indian Inst. of Technol. Bombay, Mumbai, India
  • fYear
    2010
  • fDate
    14-16 Sept. 2010
  • Firstpage
    349
  • Lastpage
    352
  • Abstract
    This paper presents a simulation study concerning the impact of the channel transport on the ON current, ION, of n-channel tunnel FETs. We show that, when the tunneling generation rate is enhanced to reach ION values approximately few μA/μm, then the ION becomes sensitive to the electron velocity in the channel. This is because, at large tunneling rates, the charge due to the generated electrons tends to modify the potential in the channel in such a way that limits the generation rate at the source. Such an electrostatic feedback is smaller the larger is the electron velocity, so that higher tunneling rates and ION values are observed when increasing the electron velocity.
  • Keywords
    field effect transistors; tunnel transistors; ION; ON current; channel transport; electron velocity; electrostatic feedback; n-TFET; n-channel tunnel FET; tunneling generation rate; Electrostatics; Junctions; Logic gates; Semiconductor process modeling; Silicon; Stress; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference (ESSDERC), 2010 Proceedings of the European
  • Conference_Location
    Sevilla
  • ISSN
    1930-8876
  • Print_ISBN
    978-1-4244-6658-0
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2010.5618219
  • Filename
    5618219