DocumentCode
2801901
Title
Impact of electron velocity on the ION of n-TFETs
Author
Virani, Hasanali ; Esseni, David ; Kottantharayil, Anil
Author_Institution
Indian Inst. of Technol. Bombay, Mumbai, India
fYear
2010
fDate
14-16 Sept. 2010
Firstpage
349
Lastpage
352
Abstract
This paper presents a simulation study concerning the impact of the channel transport on the ON current, ION, of n-channel tunnel FETs. We show that, when the tunneling generation rate is enhanced to reach ION values approximately few μA/μm, then the ION becomes sensitive to the electron velocity in the channel. This is because, at large tunneling rates, the charge due to the generated electrons tends to modify the potential in the channel in such a way that limits the generation rate at the source. Such an electrostatic feedback is smaller the larger is the electron velocity, so that higher tunneling rates and ION values are observed when increasing the electron velocity.
Keywords
field effect transistors; tunnel transistors; ION; ON current; channel transport; electron velocity; electrostatic feedback; n-TFET; n-channel tunnel FET; tunneling generation rate; Electrostatics; Junctions; Logic gates; Semiconductor process modeling; Silicon; Stress; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference (ESSDERC), 2010 Proceedings of the European
Conference_Location
Sevilla
ISSN
1930-8876
Print_ISBN
978-1-4244-6658-0
Type
conf
DOI
10.1109/ESSDERC.2010.5618219
Filename
5618219
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