DocumentCode :
2801949
Title :
Extracting accurate position and energy level of oxide trap generating random telegraph noise(RTN) in recessed channel MOSFET´s
Author :
Park, Sunyoung ; Lee, Sanghoon ; Kang, Yeonsung ; Park, Byung-Gook ; Lee, Jong-Ho ; Lee, Jooyoung ; Jin, Gyoyoung ; Shin, Hyungcheol
Author_Institution :
Sch. of Electr. Eng., Seoul Nat. Univ., Seoul, South Korea
fYear :
2010
fDate :
14-16 Sept. 2010
Firstpage :
337
Lastpage :
340
Abstract :
In this paper, we have proposed an extraction method to find accurate oxide trap locations and energy level in recessed channel structure such as SRCAT. Analytical models for poly depletion effect and the surface potential variation in the cylindrical coordinate were derived and applied to DRAM SRCAT.
Keywords :
DRAM chips; MOSFET; DRAM SRCAT; cylindrical coordinate; energy level; extraction method; metal-oxide-semiconductor field effect transistors; oxide trap locations; polydepletion effect; random telegraph noise; recessed channel MOSFET; recessed channel structure; surface potential variation; Equations; Logic gates; MOSFETs; Mathematical model; Noise; Random access memory;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference (ESSDERC), 2010 Proceedings of the European
Conference_Location :
Sevilla
ISSN :
1930-8876
Print_ISBN :
978-1-4244-6658-0
Type :
conf
DOI :
10.1109/ESSDERC.2010.5618221
Filename :
5618221
Link To Document :
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