Title :
A computational intelligent optical proximity correction for process distortion compensation of layout mask in subwavelength era
Author :
Shao-Ming Yu ; Yiming Li
Author_Institution :
Dept. of Comput. & Inf. Sci., Nat. Chiao Tung Univ., Hsinchu, Taiwan
Abstract :
In this work, the authors develop an intelligent OPC approach which combines the genetic algorithm (GA), the rule-based technique, and conventional model-based correction method to perform the mask correction in subwavelength era. Basic idea is that the GA and the lithography simulator is applied to find out the best size and position for a complete layout with those additional patterns which generated by rules.
Keywords :
circuit complexity; circuit layout; electronic engineering computing; genetic algorithms; masks; proximity effect (lithography); submillimetre waves; computational intelligent optical proximity correction; conventional model-based correction method; genetic algorithm; layout mask; lithography simulator; mask correction; process distortion compensation; rule-based technique; subwavelength era; Genetic algorithms; Submillimeter wave technology;
Conference_Titel :
Computational Electronics, 2004. IWCE-10 2004. Abstracts. 10th International Workshop on
Conference_Location :
West Lafayette, IN, USA
Print_ISBN :
0-7803-8649-3
DOI :
10.1109/IWCE.2004.1407385
