DocumentCode
2802886
Title
A microscopic quantum simulation of Si/SiO/sub 2/ interface roughness scattering in silicon nanowire transistors
Author
Jing Wang ; Polizzi, E. ; Ghosh, A. ; Datta, S. ; Lundstrom, M.
Author_Institution
Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
fYear
2004
fDate
24-27 Oct. 2004
Firstpage
247
Lastpage
248
Abstract
The silicon nanowire transistor (SNWT) has attracted broad attention as a promising device structure for future integrated circuits. As a result, the exploration of carrier transport and the modeling of various scattering mechanisms in Si nanowires become increasingly important. In this work, we perform a microscopic, quantum-mechanical simulation of Si/SiO/sub 2/ interface roughness scattering (so called "surface roughness scattering (SRS)") in SNWTs. In brief, this work provides an opportunity to understand the physics of SRS in SNWTs, which can be substantially different from that in planar MOSFETs.
Keywords
electron-electron scattering; elemental semiconductors; field effect transistors; interface roughness; nanowires; quantum theory; silicon compounds; Si-SiO/sub 2/; carrier transport; device structure; integrated circuits; interface roughness scattering; microscopic quantum simulation; quantum-mechanical simulation; scattering mechanisms; silicon nanowire transistors; surface roughness scattering; FETs; Quantum theory; Silicon compounds;
fLanguage
English
Publisher
ieee
Conference_Titel
Computational Electronics, 2004. IWCE-10 2004. Abstracts. 10th International Workshop on
Conference_Location
West Lafayette, IN, USA
Print_ISBN
0-7803-8649-3
Type
conf
DOI
10.1109/IWCE.2004.1407419
Filename
1407419
Link To Document