• DocumentCode
    2802886
  • Title

    A microscopic quantum simulation of Si/SiO/sub 2/ interface roughness scattering in silicon nanowire transistors

  • Author

    Jing Wang ; Polizzi, E. ; Ghosh, A. ; Datta, S. ; Lundstrom, M.

  • Author_Institution
    Sch. of Electr. & Comput. Eng., Purdue Univ., West Lafayette, IN, USA
  • fYear
    2004
  • fDate
    24-27 Oct. 2004
  • Firstpage
    247
  • Lastpage
    248
  • Abstract
    The silicon nanowire transistor (SNWT) has attracted broad attention as a promising device structure for future integrated circuits. As a result, the exploration of carrier transport and the modeling of various scattering mechanisms in Si nanowires become increasingly important. In this work, we perform a microscopic, quantum-mechanical simulation of Si/SiO/sub 2/ interface roughness scattering (so called "surface roughness scattering (SRS)") in SNWTs. In brief, this work provides an opportunity to understand the physics of SRS in SNWTs, which can be substantially different from that in planar MOSFETs.
  • Keywords
    electron-electron scattering; elemental semiconductors; field effect transistors; interface roughness; nanowires; quantum theory; silicon compounds; Si-SiO/sub 2/; carrier transport; device structure; integrated circuits; interface roughness scattering; microscopic quantum simulation; quantum-mechanical simulation; scattering mechanisms; silicon nanowire transistors; surface roughness scattering; FETs; Quantum theory; Silicon compounds;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Computational Electronics, 2004. IWCE-10 2004. Abstracts. 10th International Workshop on
  • Conference_Location
    West Lafayette, IN, USA
  • Print_ISBN
    0-7803-8649-3
  • Type

    conf

  • DOI
    10.1109/IWCE.2004.1407419
  • Filename
    1407419