DocumentCode
2804364
Title
Temperature dependent dielectric absorption characterization and modeling for SiN, Al2 O3 and Ta2 O5
Author
Muminovic, H. ; Riess, P. ; Baumgartner, P. ; Klein, P.
Author_Institution
Infineon Technol. Munich, Munich, Germany
fYear
2010
fDate
14-16 Sept. 2010
Firstpage
293
Lastpage
296
Abstract
This paper reports temperature dependant dielectric absorption measurements of SiN, Al2O3 and Ta2O5 MIM capacitors between 100Hz and 10GHz over a broad temperature range. The SiN dielectric clearly shows a temperature dependent dielectric absorption whereas for Al2O3 and Ta2O5 the effect is nearly temperature independent. A model is proposed for the 3 dielectric materials which takes into account dielectric absorption and temperature dependence. Depending on the dielectric material the extraction strategy has to be modified. The temperature dependence of the capacitance has to be split between temperature coefficient and temperature dependent dielectric absorption.
Keywords
MIM devices; capacitors; dielectric materials; Al2O3; MIM capacitors; SiN; SiN dielectric; Ta2O5; dielectric materials; extraction strategy; temperature coefficient; temperature dependant dielectric absorption measurements; temperature dependence; temperature dependent dielectric absorption characterization; Absorption; Aluminum oxide; Capacitance; Dielectrics; Silicon compounds; Temperature dependence; Temperature measurement;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference (ESSDERC), 2010 Proceedings of the European
Conference_Location
Sevilla
ISSN
1930-8876
Print_ISBN
978-1-4244-6658-0
Type
conf
DOI
10.1109/ESSDERC.2010.5618355
Filename
5618355
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