• DocumentCode
    2805335
  • Title

    Initial implementation of a multivariable plasma shape and position controller on the DIII-D tokamak

  • Author

    Humphreys, D.A. ; Walker, M.L. ; Leuer, J.A. ; Ferron, J.R.

  • Author_Institution
    Gen. Atomics, San Diego, CA, USA
  • fYear
    2000
  • fDate
    2000
  • Firstpage
    412
  • Lastpage
    418
  • Abstract
    A model-based multivariable controller for plasma shape control has been successfully implemented on the DIII-D tokamak. Good steady-state control of the plasma boundary shape and X-point position was demonstrated in lower single-null ohmic plasmas over several seconds of several discharges. Dynamic control for programmed rapid plasma shape variation showed significant lags in response (resulting from design choices and model error, and expected from simulation), but was robustly stable for all degrees of freedom explored. The control design was based on a linear plasma response model derived from fundamental physics assumptions, which was extensively validated against DIII-D experimental data. This physics-based model is readily extendable to next-generation device designs and to new operating regimes of existing devices. Controllers produced with robust control design methods were tested and improved using results of closed loop simulations. A comprehensive simulation of the tokamak plant including plasma response, power supplies, and coil circuit configuration allowed verification of the controller implementation in the plasma control system. This comprehensive simulation can be regulated by the plasma control system computer in exactly the same way the plasma control system controls the actual tokamak
  • Keywords
    Tokamak devices; closed loop systems; control system CAD; fusion reactor design; multivariable control systems; nuclear engineering computing; physical instrumentation control; plasma toroidal confinement; position control; robust control; shape control; DIII-D tokamak; X-point position; closed loop simulations; coil circuit configuration; dynamic control; linear plasma response model; lower single-null ohmic plasmas; model error; model-based multivariable controller; multivariable plasma position controller; multivariable plasma shape controller; next-generation device designs; plasma boundary shape; plasma control system computer; plasma response; power supplies; programmed rapid plasma shape variation; robust stability; steady-state control; tokamak plant simulation; Circuit simulation; Computational modeling; Control system synthesis; Plasma devices; Plasma simulation; Plasma stability; Robust control; Shape control; Steady-state; Tokamaks;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Control Applications, 2000. Proceedings of the 2000 IEEE International Conference on
  • Conference_Location
    Anchorage, AK
  • Print_ISBN
    0-7803-6562-3
  • Type

    conf

  • DOI
    10.1109/CCA.2000.897459
  • Filename
    897459