DocumentCode
2805993
Title
Carbon nanotube lateral field emission devices
Author
Lee, Seung-Beck ; The, A.-S. ; Teo, K.B.K. ; Hasko, D.G. ; Ahmed, Hameeza ; Milne, W.I. ; Amaratunga, G.A.J.
Author_Institution
Dept. of Nanotechnol., Hanyang Univ., Seoul, South Korea
fYear
2003
fDate
28-30 May 2003
Firstpage
70
Lastpage
71
Abstract
Fabrication and operation of a carbon nanotube lateral field emission device is reported. Compared to vertical field emitters using carbon nanotube cathodes, it has less alignment problems since the anode is fabricated at the same time as the cathode and the gates, and also may have reduced leakage since the electrodes are well separated. We use thermally oxidised S as the substrate. Initially, Cr/Au alignment marks are deposited to use as reference markers. Then a thin layer of Al is evaporated, which act as the sacrificial layer. Multi-wall carbon nanotubes (MWCNT) were synthesised by plasma-enhanced chemical vapour deposition and dispersed on the Al surface. Electron beam lithography is used to define the anode, gates and the cathode contacts of the devices. After Cr/Al metal deposition and lift-off the sacrificial Al is etched away leaving the carbon nanotube suspended. An scanning electron microscopy (SEM) image of a carbon nanotube lateral field emitter was showed.
Keywords
aluminium; carbon nanotubes; chromium; electron beam lithography; field emission; gold; nanotube devices; plasma CVD; scanning electron microscopy; thin films; Al; Al surface; C; Cr-Au; Cr/Al metal deposition; SEM image; carbon nanotube cathodes; carbon nanotube lateral field emission devices; carbon nanotube lateral field emitter; electron beam lithography; multiwall carbon nanotubes; plasma enhanced chemical vapour deposition; sacrificial layer; scanning electron microscopy image; vertical field emitters; Anodes; Carbon nanotubes; Cathodes; Chromium; Electrodes; Fabrication; Gold; Plasma applications; Plasma chemistry; Scanning electron microscopy;
fLanguage
English
Publisher
ieee
Conference_Titel
Vacuum Electronics, 2003 4th IEEE International Conference on
Conference_Location
Seoul, South Korea
Print_ISBN
0-7803-7699-4
Type
conf
DOI
10.1109/IVEC.2003.1286062
Filename
1286062
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