DocumentCode :
2806413
Title :
Mismatch sources in LDMOS devices
Author :
Andricciola, Pietro ; Tuinhout, Hans
Author_Institution :
Device Modeling & Characterization, NXP Semicond., Eindhoven, Netherlands
fYear :
2010
fDate :
14-16 Sept. 2010
Firstpage :
126
Lastpage :
129
Abstract :
This paper discusses the influence of different sources of DC parametric mismatch in an LDMOS. By comparing measurements and statistical simulations the impact on mismatch of the most important fluctuation causes is qualitatively evaluated. We demonstrate that, whereas the shape of the doping profile in the channel has little effect, both interface states and series resistances play a major role in the mismatch. This work forms a crucial first step towards a better understanding of the random fluctuation mechanisms present in LDMOS devices used in MMICs.
Keywords :
MMIC; MOSFET; doping profiles; interface states; parametric devices; DC parametric mismatch sources; LDMOS devices; MMIC; doping profile; interface states; lateral diffused MOS transistor; random fluctuation; series resistances; statistical simulations; Correlation; Current measurement; Doping; Interface states; Logic gates; Semiconductor process modeling;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Solid-State Device Research Conference (ESSDERC), 2010 Proceedings of the European
Conference_Location :
Sevilla
ISSN :
1930-8876
Print_ISBN :
978-1-4244-6658-0
Type :
conf
DOI :
10.1109/ESSDERC.2010.5618457
Filename :
5618457
Link To Document :
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