• DocumentCode
    2806413
  • Title

    Mismatch sources in LDMOS devices

  • Author

    Andricciola, Pietro ; Tuinhout, Hans

  • Author_Institution
    Device Modeling & Characterization, NXP Semicond., Eindhoven, Netherlands
  • fYear
    2010
  • fDate
    14-16 Sept. 2010
  • Firstpage
    126
  • Lastpage
    129
  • Abstract
    This paper discusses the influence of different sources of DC parametric mismatch in an LDMOS. By comparing measurements and statistical simulations the impact on mismatch of the most important fluctuation causes is qualitatively evaluated. We demonstrate that, whereas the shape of the doping profile in the channel has little effect, both interface states and series resistances play a major role in the mismatch. This work forms a crucial first step towards a better understanding of the random fluctuation mechanisms present in LDMOS devices used in MMICs.
  • Keywords
    MMIC; MOSFET; doping profiles; interface states; parametric devices; DC parametric mismatch sources; LDMOS devices; MMIC; doping profile; interface states; lateral diffused MOS transistor; random fluctuation; series resistances; statistical simulations; Correlation; Current measurement; Doping; Interface states; Logic gates; Semiconductor process modeling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Solid-State Device Research Conference (ESSDERC), 2010 Proceedings of the European
  • Conference_Location
    Sevilla
  • ISSN
    1930-8876
  • Print_ISBN
    978-1-4244-6658-0
  • Type

    conf

  • DOI
    10.1109/ESSDERC.2010.5618457
  • Filename
    5618457