DocumentCode
2806413
Title
Mismatch sources in LDMOS devices
Author
Andricciola, Pietro ; Tuinhout, Hans
Author_Institution
Device Modeling & Characterization, NXP Semicond., Eindhoven, Netherlands
fYear
2010
fDate
14-16 Sept. 2010
Firstpage
126
Lastpage
129
Abstract
This paper discusses the influence of different sources of DC parametric mismatch in an LDMOS. By comparing measurements and statistical simulations the impact on mismatch of the most important fluctuation causes is qualitatively evaluated. We demonstrate that, whereas the shape of the doping profile in the channel has little effect, both interface states and series resistances play a major role in the mismatch. This work forms a crucial first step towards a better understanding of the random fluctuation mechanisms present in LDMOS devices used in MMICs.
Keywords
MMIC; MOSFET; doping profiles; interface states; parametric devices; DC parametric mismatch sources; LDMOS devices; MMIC; doping profile; interface states; lateral diffused MOS transistor; random fluctuation; series resistances; statistical simulations; Correlation; Current measurement; Doping; Interface states; Logic gates; Semiconductor process modeling;
fLanguage
English
Publisher
ieee
Conference_Titel
Solid-State Device Research Conference (ESSDERC), 2010 Proceedings of the European
Conference_Location
Sevilla
ISSN
1930-8876
Print_ISBN
978-1-4244-6658-0
Type
conf
DOI
10.1109/ESSDERC.2010.5618457
Filename
5618457
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