Title :
Influence of MgO geometrical surface profiles on the secondary electron emission coefficient(?) in AC-PDP
Author :
Park, W.B. ; Oh, J.S. ; Jeong, H.S. ; Jeong, J.C. ; Lim, J.Y. ; Cho, J.W. ; Choi, E.H.
Author_Institution :
Dept. of Electrophys., Kwangwoon Univ., Seoul, South Korea
Abstract :
The secondary electron emission coefficient? from MgO(magnesium oxide) protective layer of the geometrical surface profiles was studied. The? was measured by the method of ? -FIB system (focused ion beam system). The geometrical surface profiles on the MgO protective layers were made by the method of electron beam evaporation (e-gun) There was two type of MgO protective layer in this paper. The one type has the microscopic structures on the first MgO protective layer. To make this using by a mask of mesh fixed in front of the first layer in the e-gun chamber. The geometrical surface profiles on the MgO protective layer has been founded higher? values from 0.054 up to 0.114 than normal one ranged from 0.048 to 0.099 under Ne+ ion energies from 80V to 200V. The other type is made on the substrate of it has geometrical surface profiles already. This MgO protective layer was made by a screen printing and a photo lithography. The geometrical surface profiles on the MgO protective layer has been founded higher? values from 0.039 up to 0.094 than normal one ranged from 0.026 to 0.079 under Ne+ ion energies from 80V to 200V. Also it on the substrate of geometrical surface profiles has been founded? value from 0.043 up to 0.183 than normal one ranged from 0.038 to 0.154 under He+ ion energies from 80V to 200V.
Keywords :
electron beam deposition; focused ion beam technology; magnesium compounds; plasma displays; secondary electron emission; thin films; 80 to 200 V; AC-PDP; FIB system; He+ ion energies; MgO; MgO geometrical surface profiles; MgO protective layers; Ne+ ion energies; alternating current-plasma display panels; electron beam evaporation; electron gun chamber; focused ion beam; microscopic structures; photolithography; screen printing; secondary electron emission coefficient; Electron beams; Electron emission; Finite impulse response filter; Ion beams; Laboratories; Microscopy; Particle beams; Plasmas; Printing; Protection;
Conference_Titel :
Vacuum Electronics, 2003 4th IEEE International Conference on
Print_ISBN :
0-7803-7699-4
DOI :
10.1109/IVEC.2003.1286142