• DocumentCode
    2808068
  • Title

    Characterizations of ZnO thin films deposited onto langasite substrates by r.f. magnetron sputtering

  • Author

    Yang, Ping-Feng ; Wen, Hua-Chiang ; Jian, Sheng-Rui ; Lai, Yi-Shao ; Wu, Sean ; Chen, Rong-Sheng

  • Author_Institution
    Adv. Semicond. Eng., Inc., Kaohsiung
  • fYear
    2007
  • fDate
    1-3 Oct. 2007
  • Firstpage
    184
  • Lastpage
    188
  • Abstract
    We investigated in this study structural and nanomechanical properties of zinc oxide (ZnO) thin films deposited onto langasite substrates at 200degC through r.f. magnetron sputtering with an r.f. power at 200 W in an 02/Ar gas mixture for different deposition time at 1, 2, and 3 h. Surface morphologies and crystalline structural characteristics were examined using x-ray diffraction (XRD), scanning electron microscopy (SEM), and atomic force microscopy (AFM). The deposited film featured a polycrystalline nature, with (100), (002), and (101) peaks of hexagonal ZnO at 31.75deg, 34.35deg, and 36.31deg. As the deposition time increased, the ZnO film became predominantly oriented along the c-axis (002) and the surface roughness decreased. Through Berkovich nanoindentation following a continuous stiffness measurement (CSM) technique, the hardness and Young´s modulus of the ZnO thin films increased as the deposition time increased, with the best results being obtained for the deposition time of 3 h.
  • Keywords
    II-VI semiconductors; X-ray diffraction; Young´s modulus; atomic force microscopy; hardness; indentation; scanning electron microscopy; semiconductor thin films; sputter deposition; surface morphology; surface roughness; zinc compounds; AFM; Berkovich nanoindentation; La3Ga5SiO14; RF magnetron sputtering; SEM; X-ray diffraction; XRD; Young´s modulus; ZnO; atomic force microscopy; continuous stiffness measurement technique; crystalline structural characteristics; film hardness; hexagonal film; langasite substrates; nanomechanical properties; power 200 W; scanning electron microscopy; surface morphologies; surface roughness; temperature 200 C; time 1 h; time 2 h; time 3 h; zinc oxide thin film deposition; Argon; Atomic force microscopy; Crystallization; Magnetic properties; Scanning electron microscopy; Sputtering; Substrates; Surface morphology; X-ray diffraction; Zinc oxide;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Microsystems, Packaging, Assembly and Circuits Technology, 2007. IMPACT 2007. International
  • Conference_Location
    Taipei
  • Print_ISBN
    978-1-4244-1636-3
  • Electronic_ISBN
    978-1-4244-1637-0
  • Type

    conf

  • DOI
    10.1109/IMPACT.2007.4433597
  • Filename
    4433597