Title :
CF4 abatement by atmospheric pressure microwave plasma torch
Author :
Hong, Yong C. ; Uhm, Han S.
Author_Institution :
Dept. of Molecular Sci. & Technol., Ajou Univ., Suwon, South Korea
Abstract :
This article deals with CF4 abatement by electrodeless atmospheric pressure microwave plasma torch. The plasma abatement device is attached to the vacuum pump, which discharges the nitrogen gas with contaminants. The abatement was carried out using oxygen and air as an additive gases. The destruction and removal efficiency (DRE) of more than 98% was achieved for tetrafluoromethane(CF4). The detailed characterization of CF4 abatement using Fourier transform infrared (FT-IR) and quadrupole mass spectrometer (QMS) showed the major PFC by-products.
Keywords :
Fourier transform spectra; discharges (electric); infrared spectra; microwave devices; nitrogen; organic compounds; plasma torches; vacuum pumps; CF4 abatement; Fourier transform infrared; N2; destruction and removal efficiency; electrodeless atmospheric pressure microwave plasma torch; global warming gases; nitrogen gas; perfluorocompounds destruction; plasma abatement; quadrupole mass spectrometer; semiconductor industry; tetrafluoromethane abatement; Atmospheric-pressure plasmas; Electromagnetic heating; Gases; Global warming; Microwave devices; Nitrogen; Nuclear and plasma sciences; Plasma applications; Plasma chemistry; Plasma devices;
Conference_Titel :
Vacuum Electronics, 2003 4th IEEE International Conference on
Print_ISBN :
0-7803-7699-4
DOI :
10.1109/IVEC.2003.1286243
