• DocumentCode
    2816459
  • Title

    High-performance microwave power MESFETs on GaAs/Si

  • Author

    Sriram, S. ; Messham, R.L. ; Smith, T.J. ; Hobgood, H.M. ; Driver, M.C.

  • Author_Institution
    Westinghouse Sci. & Technol. Center, Pittsburgh, PA, USA
  • fYear
    1990
  • fDate
    7-10 Oct. 1990
  • Firstpage
    229
  • Lastpage
    232
  • Abstract
    The growth and fabrication of GaAs power MESFETs on high-resistivity, 3-inch diameter, float-zone Si substrates is discussed. These devices show high power-added efficiencies up to 51% and power output up to 447 mW/mm at 3 GHz. At 6 GHz power-added efficiency up to 42% and power output up to 447 mW/mm are obtained. The small-signal gain of these devices is very similar to those on GaAs substrates at 2 GHz (maximum stable gain is 18 dB), but was lower at 10 GHz (maximum available gain is 7-11 dB). Higher frequency performance in these devices is presently limited by parasitic conduction in a thin layer near the GaAs/Si interface. This has been characterized using special test structures, and possible means to overcome these problems and improve the performance are outlined.<>
  • Keywords
    III-V semiconductors; Schottky gate field effect transistors; gallium arsenide; power transistors; solid-state microwave devices; 2 to 10 GHz; 51 percent; 7 to 18 dB; GaAs-Si; SHF; Si substrates; fabrication; float-zone Si substrates; growth; microwave power MESFETs; parasitic conduction; Conductivity; Dielectric losses; Dielectric substrates; Epitaxial growth; Fabrication; Frequency; Gallium arsenide; MESFETs; Microstrip; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 1990. Technical Digest 1990., 12th Annual
  • Conference_Location
    New Orleans, LA, USA
  • Type

    conf

  • DOI
    10.1109/GAAS.1990.175494
  • Filename
    175494