DocumentCode :
2816459
Title :
High-performance microwave power MESFETs on GaAs/Si
Author :
Sriram, S. ; Messham, R.L. ; Smith, T.J. ; Hobgood, H.M. ; Driver, M.C.
Author_Institution :
Westinghouse Sci. & Technol. Center, Pittsburgh, PA, USA
fYear :
1990
fDate :
7-10 Oct. 1990
Firstpage :
229
Lastpage :
232
Abstract :
The growth and fabrication of GaAs power MESFETs on high-resistivity, 3-inch diameter, float-zone Si substrates is discussed. These devices show high power-added efficiencies up to 51% and power output up to 447 mW/mm at 3 GHz. At 6 GHz power-added efficiency up to 42% and power output up to 447 mW/mm are obtained. The small-signal gain of these devices is very similar to those on GaAs substrates at 2 GHz (maximum stable gain is 18 dB), but was lower at 10 GHz (maximum available gain is 7-11 dB). Higher frequency performance in these devices is presently limited by parasitic conduction in a thin layer near the GaAs/Si interface. This has been characterized using special test structures, and possible means to overcome these problems and improve the performance are outlined.<>
Keywords :
III-V semiconductors; Schottky gate field effect transistors; gallium arsenide; power transistors; solid-state microwave devices; 2 to 10 GHz; 51 percent; 7 to 18 dB; GaAs-Si; SHF; Si substrates; fabrication; float-zone Si substrates; growth; microwave power MESFETs; parasitic conduction; Conductivity; Dielectric losses; Dielectric substrates; Epitaxial growth; Fabrication; Frequency; Gallium arsenide; MESFETs; Microstrip; Silicon;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 1990. Technical Digest 1990., 12th Annual
Conference_Location :
New Orleans, LA, USA
Type :
conf
DOI :
10.1109/GAAS.1990.175494
Filename :
175494
Link To Document :
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