DocumentCode :
2816506
Title :
A GaAs vertical PIN diode production process
Author :
Zych, D. ; Beall, J. ; Seymour, D. ; Delaney, J. ; Mercer, B. ; Stidham, J. ; Wdowik, M.
Author_Institution :
Texas Instruments Inc., Dallas, TX, USA
fYear :
1990
fDate :
7-10 Oct. 1990
Firstpage :
241
Lastpage :
244
Abstract :
A GaAs vertical PIN diodes production process which integrates TaN resistors, MIM capacitors, plated airbridges, transmission lines, and via interconnects on the same MMIC chip is developed. A variety of circuit types, with high probe yields and excellent RF performance, have been fabricated. By eliminating the need for hybrid PIN diodes, this process makes significant advances in reducing the cost and complexity of radar assemblies. The monolithic microwave IC (MMIC) process flow, DC probe yields, and diode performance are reported.<>
Keywords :
III-V semiconductors; MMIC; gallium arsenide; integrated circuit manufacture; p-i-n diodes; DC probe yields; GaAs; MIM capacitors; MMIC process flow; TaN resistors; diode performance; monolithic microwave IC; plated airbridges; production process; transmission lines; vertical PIN diode; via interconnects; Costs; Distributed parameter circuits; Gallium arsenide; Integrated circuit interconnections; MIM capacitors; MMICs; Probes; Production; Radio frequency; Resistors;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Gallium Arsenide Integrated Circuit (GaAs IC) Symposium, 1990. Technical Digest 1990., 12th Annual
Conference_Location :
New Orleans, LA, USA
Type :
conf
DOI :
10.1109/GAAS.1990.175497
Filename :
175497
Link To Document :
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