Title :
Simulation Study of Reduced Self-Heating in Novel Thin-SOI Vertical Bipolar Transistors
Author :
Ouyang, Qiqing ; Xiu, Kai
Author_Institution :
IBM Research Division, T. J. Watson Research Center, Yorktown Heights, NY 10598. phone:
Abstract :
Simulations have been performed to study the self-heating in thin-SOI, vertical bipolar transistors for the first time. Two new device structures are proposed and the simulations show that they can improve the heat dissipation significantly. By adding a heat sink connecting the collector and the substrate and/or having a thin localized BOX underneath the SOI collector, self-heating can be reduced substantially without increasing device area or degrading device performance.
Keywords :
Back; Bipolar transistors; Conductivity; Degradation; Heat sinks; Joining processes; Medical simulation; Numerical analysis; Scanning electron microscopy; Temperature;
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 2005. SISPAD 2005. International Conference on
Print_ISBN :
4-9902762-0-5
DOI :
10.1109/SISPAD.2005.201471