DocumentCode :
2817524
Title :
Simulation Study of Reduced Self-Heating in Novel Thin-SOI Vertical Bipolar Transistors
Author :
Ouyang, Qiqing ; Xiu, Kai
Author_Institution :
IBM Research Division, T. J. Watson Research Center, Yorktown Heights, NY 10598. phone:
fYear :
2005
fDate :
01-03 Sept. 2005
Firstpage :
55
Lastpage :
58
Abstract :
Simulations have been performed to study the self-heating in thin-SOI, vertical bipolar transistors for the first time. Two new device structures are proposed and the simulations show that they can improve the heat dissipation significantly. By adding a heat sink connecting the collector and the substrate and/or having a thin localized BOX underneath the SOI collector, self-heating can be reduced substantially without increasing device area or degrading device performance.
Keywords :
Back; Bipolar transistors; Conductivity; Degradation; Heat sinks; Joining processes; Medical simulation; Numerical analysis; Scanning electron microscopy; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Simulation of Semiconductor Processes and Devices, 2005. SISPAD 2005. International Conference on
Print_ISBN :
4-9902762-0-5
Type :
conf
DOI :
10.1109/SISPAD.2005.201471
Filename :
1562023
Link To Document :
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