Title :
Long-wavelength lasing from InAs self-assembled quantum dots on (311)B InP by gas-source molecular beam epitaxy
Author :
Nishi, Kenichi ; Yamada, Mitsuki ; Anan, Takayoshi ; Gomyo, Akiko ; Sugou, Shigeo
Author_Institution :
Optoelectron. & High Frequency Device Res. Labs., NEC Corp., Ibaraki, Japan
Abstract :
InAs quantum dots were grown on (311)B InP by self-assembly using gas-source molecular beam epitaxy. 0.33 nm-InAs depositions in nominal thickness formed quantum dots with a lateral dimension of about 43 nm and a density of 2×1010 cm-2. Laser diodes with seven quantum dot active layers lased evenly at room temperature under a pulsed-current injection mode. At room temperature, a threshold current density of 4.8 kA/cm2 and the lasing wavelength of 1.4 μm were obtained in a 92%/98% high-reflection coated device with a cavity length of 1.1 mm. Devices with as-cleaved facets lased in a wavelength range from 1.1 to 1.4 μm at 77 K. The lasing wavelength changed to a shorter wavelength as the cavity length decreased, indicating gain saturation due to state filling effect in discrete quantum levels, which is typical in quantum dot lasers. Thus, the InAs quantum dots on (311)B InP were found to be promising for active layers in long-wavelength quantum dot lasers
Keywords :
III-V semiconductors; chemical beam epitaxial growth; indium compounds; quantum well lasers; semiconductor growth; semiconductor quantum dots; (311)B InP; 0.33 nm; 1.1 mm; 1.1 to 1.4 mum; 1.4 mum; 77 K; InAs; InAs self-assembled quantum dots; InP; cavity length; discrete quantum levels; gain saturation; gas-source molecular beam epitaxy; long-wavelength lasing; room temperature; state filling effect; threshold current density; Diode lasers; Filling; Indium phosphide; Molecular beam epitaxial growth; Optical pulses; Quantum dot lasers; Quantum dots; Self-assembly; Temperature; Threshold current;
Conference_Titel :
Indium Phosphide and Related Materials, 1998 International Conference on
Conference_Location :
Tsukuba
Print_ISBN :
0-7803-4220-8
DOI :
10.1109/ICIPRM.1998.712427