DocumentCode :
2817901
Title :
Influence of strain compensation on structural and electrical properties of InAlAs/InGaAs HEMT structures grown on InP
Author :
Letarte, X. ; Rojo-Romeo, P. ; Tardy, J. ; Bejar, M. ; Gendry, M. ; Py, M.A. ; Beck, M. ; Buhlmann, H.J. ; Ren, L. ; Villa, C. ; Sanz-Hervas, A. ; Serrano, J.J. ; Blanco, J.M. ; Aguilar, Mario ; Marty, O. ; Souliere, V. ; Monteil, Y.
Author_Institution :
CNRS, Ecole Centrale de Lyon, Ecully, France
fYear :
1998
fDate :
11-15 May 1998
Firstpage :
215
Lastpage :
218
Abstract :
In this work, in order to improve mechanical stability of pseudomorphic HEMTs (PMHEMTs), we propose a pseudomorphic InAlAs/InGaAs/InP structure where the channel and the spacer are strain compensated: as in the conventional structure, the InGaAs channel is compressively strained, but the InAlAs spacer is now tensilely strained. Such a configuration stabilises the whole structure because any strain relaxation in the channel (resp. spacer) should induce an increase of strain in the spacer (resp. channel). In other words, the mechanical state remains metastable but the structure must overcome a higher energy barrier to reach the actual stable state (fully relaxed). Strain compensation has been successfully used previously, in InAsP/lnGaP multi quantum well (MQW) structures for optoelectronic devices. These authors show that a higher number of strained quantum wells can be grown before the appearance of plastic relaxation. In HEMTs, where no MQW is used, an increase of the critical thickness of the channel is expected. In our study, we demonstrate that the use of strain compensation can stabilise PMHEMT structures without spoiling their electrical properties
Keywords :
III-V semiconductors; aluminium compounds; gallium arsenide; high electron mobility transistors; indium compounds; stress relaxation; InAlAs; InAlAs/InGaAs HEMT structures; InGaAs; InP; InP substrate; PMHEMTs; critical thickness; electrical properties; mechanical stability; mechanical state; plastic relaxation; pseudomorphic HEMTs; strain compensation; strain relaxation; structural properties; Capacitive sensors; Energy barrier; Indium compounds; Indium gallium arsenide; Indium phosphide; Metastasis; PHEMTs; Quantum well devices; Stability; Tensile strain;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1998 International Conference on
Conference_Location :
Tsukuba
ISSN :
1092-8669
Print_ISBN :
0-7803-4220-8
Type :
conf
DOI :
10.1109/ICIPRM.1998.712440
Filename :
712440
Link To Document :
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