DocumentCode :
2817904
Title :
Acoustic characterization of thin polymer layers for Love mode surface acoustic waveguide
Author :
El Fissi, L. ; Friedt, J. -M ; Ballandras, S. ; Robert, L. ; Chérioux, F.
Author_Institution :
Parc de Haute Technol., SENSEOR, Mougins
fYear :
2008
fDate :
19-21 May 2008
Firstpage :
711
Lastpage :
716
Abstract :
Beyond the great gravimetric sensitivity provided by the polymer guiding layer of shear surface wave on quartz resulting from a low acoustic velocity, the use of photo resists provide economical means of depositing guiding layers of optimal thicknesses compared to inorganic layer deposition processes (typically PECVD deposition of silicon dioxide lasting several hours). We here analyze the evolution of the guiding layer properties, i.e. the acoustic velocity and losses, as a function of time (solvent evaporation following photo resist spin coating) and temperature (typical baking steps). The polymer films is deposited on an AT-cut quartz substrate patterned with passivated (SiO2) interdigital transducers (Al) for generating 40 mum-wavelength shear waves converted to a guided Love mode in a delay line configuration. We exploit experimental characterization results via a model of acoustic wave propagation to determine physical parameters of the layer. We then have determined materials coefficient such as viscosity, elastic and thermoelastic constants and density out of the velocity and insertion loss measurements.
Keywords :
Love waves; acoustic wave propagation; interdigital transducers; photoresists; polymer films; quartz; surface acoustic wave delay lines; surface acoustic wave transducers; surface acoustic wave waveguides; AT-cut quartz substrate; Love mode surface acoustic waveguide; SiO2; acoustic characterization; gravimetric sensitivity; inorganic layer deposition; passivated interdigital transducers; photo resists; polymer films; polymer guiding layer; shear surface wave; thin polymer layers; Acoustic transducers; Acoustic waveguides; Coatings; Delay lines; Polymer films; Resists; Silicon compounds; Solvents; Surface acoustic waves; Temperature;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Frequency Control Symposium, 2008 IEEE International
Conference_Location :
Honolulu, HI
ISSN :
1075-6787
Print_ISBN :
978-1-4244-1794-0
Electronic_ISBN :
1075-6787
Type :
conf
DOI :
10.1109/FREQ.2008.4623091
Filename :
4623091
Link To Document :
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