DocumentCode
2818005
Title
Effects of Local Electric Field and Effective Tunnel Mass on the Simulation of Band-to-Band Tunnel Diode Model
Author
Kim, Kyung Rok ; Dutton, Robert W.
Author_Institution
CISX 302, Stanford University, Stanford, CA 94305, USA. Phone:
fYear
2005
fDate
01-03 Sept. 2005
Firstpage
159
Lastpage
162
Abstract
We propose a numerical band-to-band tunneling model that is suitable for forward-biased silicon tunnel diode simulation. In this model, the tunneling attenuation factor, which depends on the local electric field and effective tunnel mass, determines the tunneling rate and negative differential resistance characteristics of the tunnel diode. Simulation results with the reduced tunnel mass mrx *= 0.10m0 considering conductivity electron mass in the conduction band and light-hole mass in the valence band show good agreement with the theoretical calculations for reasonable doping ranges (2.5kB T < qVn,p < 7.5kB T). This local BTBT model is advantageous for fast simulation of tunnel devices using numerical device simulators.
Keywords
Attenuation; Conductivity; Diodes; Doping; Electric resistance; Electrons; Numerical models; Semiconductor process modeling; Silicon; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices, 2005. SISPAD 2005. International Conference on
Print_ISBN
4-9902762-0-5
Type
conf
DOI
10.1109/SISPAD.2005.201497
Filename
1562049
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