• DocumentCode
    2818005
  • Title

    Effects of Local Electric Field and Effective Tunnel Mass on the Simulation of Band-to-Band Tunnel Diode Model

  • Author

    Kim, Kyung Rok ; Dutton, Robert W.

  • Author_Institution
    CISX 302, Stanford University, Stanford, CA 94305, USA. Phone:
  • fYear
    2005
  • fDate
    01-03 Sept. 2005
  • Firstpage
    159
  • Lastpage
    162
  • Abstract
    We propose a numerical band-to-band tunneling model that is suitable for forward-biased silicon tunnel diode simulation. In this model, the tunneling attenuation factor, which depends on the local electric field and effective tunnel mass, determines the tunneling rate and negative differential resistance characteristics of the tunnel diode. Simulation results with the reduced tunnel mass mrx*= 0.10m0considering conductivity electron mass in the conduction band and light-hole mass in the valence band show good agreement with the theoretical calculations for reasonable doping ranges (2.5kBT < qVn,p< 7.5kBT). This local BTBT model is advantageous for fast simulation of tunnel devices using numerical device simulators.
  • Keywords
    Attenuation; Conductivity; Diodes; Doping; Electric resistance; Electrons; Numerical models; Semiconductor process modeling; Silicon; Tunneling;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices, 2005. SISPAD 2005. International Conference on
  • Print_ISBN
    4-9902762-0-5
  • Type

    conf

  • DOI
    10.1109/SISPAD.2005.201497
  • Filename
    1562049