Title :
UV-250 patterning of sub-micron tapered active layers
Author :
Tregoat, D. ; Colson, V. ; Coquard, J. ; le Gouezigou, L. ; Lestra, A. ; Pinquier, A. ; Poingt, F. ; Fernier, B.
Author_Institution :
Alcatel Alsthom Corp. Res. Centre, Marcoussis, France
Abstract :
This paper reports the first results on Fabry-Perot 1.3 μm lasers with sub-micron tapered active layers defined using a UV-250 patterning technology in combination with conventional RIE processing of InP. Its implementation to the full 2 inch wafer process flow is of interest in low cost module fabrication. Short lasers (500 μm) with low coupling loss (3.4 dB with end cleaved fiber) and high quantum efficiency (0.26 W/A at 85°C) are demonstrated
Keywords :
quantum well lasers; sputter etching; ultraviolet lithography; 1.3 mum; 2 inch wafer process flow; 500 mum; 85 degC; Fabry-Perot lasers; InP; RIE processing; UV-250 patterning; coupling loss; low cost module fabrication; quantum efficiency; short lasers; sub-micron tapered active layers; Chemical technology; Costs; Fabry-Perot; Fiber lasers; Laser modes; Optical coupling; Optical device fabrication; Optical fibers; Resists; Waveguide lasers;
Conference_Titel :
Indium Phosphide and Related Materials, 1998 International Conference on
Conference_Location :
Tsukuba
Print_ISBN :
0-7803-4220-8
DOI :
10.1109/ICIPRM.1998.712458
