DocumentCode
2818559
Title
The Effect of Degeneracy on Electron Transport in Strained Silicon Inversion Layers
Author
Ungersboeck, E. ; Kosina, H.
Author_Institution
Institute for Microelectronics, TU Wien, Gußhausstraße 27-29/E360, 1040 Wien, Austria, Phone: +43-1-58801/36022, Fax: +43-1- 58801/36099, E-mail: ungersboeck@iue.tuwien.ac.at
fYear
2005
fDate
01-03 Sept. 2005
Firstpage
311
Lastpage
314
Abstract
The effect of degeneracy both on the phononlimited mobility and the effective mobility including surface-roughness scattering in unstrained and biaxially tensile strained Si inversion layers is analyzed. We introduce a new method for the inclusion of the Pauli principle in a Monte Carlo algorithm. We show that incidentally degeneracy has a minor effect on the bulk effective mobility, despite non-degenerate statistics yields unphysical subband populations and an underestimation of the mean electron energy. The effective mobility of strained inversion layers slightly increases at high inversion layer concentrations when taking into account degenerate statistics.
Keywords
Capacitive sensors; Electron mobility; Kinetic energy; Microelectronics; Monte Carlo methods; Rough surfaces; Scattering; Silicon; Statistics; Surface roughness;
fLanguage
English
Publisher
ieee
Conference_Titel
Simulation of Semiconductor Processes and Devices, 2005. SISPAD 2005. International Conference on
Print_ISBN
4-9902762-0-5
Type
conf
DOI
10.1109/SISPAD.2005.201535
Filename
1562087
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