• DocumentCode
    2818559
  • Title

    The Effect of Degeneracy on Electron Transport in Strained Silicon Inversion Layers

  • Author

    Ungersboeck, E. ; Kosina, H.

  • Author_Institution
    Institute for Microelectronics, TU Wien, Gußhausstraße 27-29/E360, 1040 Wien, Austria, Phone: +43-1-58801/36022, Fax: +43-1- 58801/36099, E-mail: ungersboeck@iue.tuwien.ac.at
  • fYear
    2005
  • fDate
    01-03 Sept. 2005
  • Firstpage
    311
  • Lastpage
    314
  • Abstract
    The effect of degeneracy both on the phononlimited mobility and the effective mobility including surface-roughness scattering in unstrained and biaxially tensile strained Si inversion layers is analyzed. We introduce a new method for the inclusion of the Pauli principle in a Monte Carlo algorithm. We show that incidentally degeneracy has a minor effect on the bulk effective mobility, despite non-degenerate statistics yields unphysical subband populations and an underestimation of the mean electron energy. The effective mobility of strained inversion layers slightly increases at high inversion layer concentrations when taking into account degenerate statistics.
  • Keywords
    Capacitive sensors; Electron mobility; Kinetic energy; Microelectronics; Monte Carlo methods; Rough surfaces; Scattering; Silicon; Statistics; Surface roughness;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    Simulation of Semiconductor Processes and Devices, 2005. SISPAD 2005. International Conference on
  • Print_ISBN
    4-9902762-0-5
  • Type

    conf

  • DOI
    10.1109/SISPAD.2005.201535
  • Filename
    1562087