DocumentCode :
2819720
Title :
Extremely large refractive index of strained GaInNAs thin films
Author :
Kitatani, T. ; Kondow, M. ; Shinoda, K. ; Yazawa, Y. ; Okai, M. ; Uomi, K.
Author_Institution :
RWCP Opt. Interconnection, Hitachi Ltd., Tokyo, Japan
fYear :
1998
fDate :
11-15 May 1998
Firstpage :
341
Lastpage :
344
Abstract :
The refractive index of-strained GaInNAs layers was investigated. By spectroscopic ellipsometry (SE), changes in the optical constants of GaInNAs layers could be observed clearly, even though the layers were as thin as 6 nm and the nitrogen content was less than 1%. The refractive index of GaInNAs was found by ellipsometric analysis to increase in proportion to the nitrogen content taking the layer strain into account. The increase in the refractive index as the bandgap energy decreased was consistent with that observed in conventional III-V alloy semiconductors. The rate of increase relative to the bandgap shrinkage was, however, more than triple that in GaInAs. This may be due to the high density of states in the conduction band, which is unique to this type of material system that includes nitrogen atoms
Keywords :
III-V semiconductors; electronic density of states; ellipsometry; energy gap; gallium arsenide; gallium compounds; indium compounds; refractive index; GaInNAs; bandgap energy; bandgap shrinkage; density of states; nitrogen content; refractive index; spectroscopic ellipsometry; strained thin films; Ellipsometry; III-V semiconductor materials; Nitrogen; Optical films; Optical refraction; Photonic band gap; Refractive index; Spectroscopy; Transistors; Ultraviolet sources;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1998 International Conference on
Conference_Location :
Tsukuba
ISSN :
1092-8669
Print_ISBN :
0-7803-4220-8
Type :
conf
DOI :
10.1109/ICIPRM.1998.712472
Filename :
712472
Link To Document :
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