Investigation of optical proximity correction (OPC) and non-uniformities on the performance of resistivity and linewidth measurements

Author

Smith, S. ; Walton, A.J. ; Fallon, M.

Author_Institution

Dept. of Electron. & Electr. Eng., Edinburgh Univ., UK

fYear

1999

fDate

1999

Firstpage

161

Lastpage

166

Abstract

The effect of optical proximity correction (OPC) on test structures is examined using DEPICT for the lithography simulation and MEDICI for the electrical calculations. It is concluded that OPC can be successfully used to reduce line shortening due to the voltage taps without causing necking effects on the track being measured. The effect of asymmetries (which may be introduced as a result of OPC) on the measurement of Greek crosses are also addressed and methods of accurately extracting sheet resistance from structures exhibiting these effects are discussed

Keywords

electric resistance measurement; electrical resistivity; electronic engineering computing; integrated circuit measurement; photolithography; proximity effect (lithography); semiconductor process modelling; size measurement; software tools; DEPICT lithography simulation; Greek cross measurements; MEDICI electrical calculations; OPC; asymmetry effects; line shortening; linewidth measurements; nonuniformities; optical proximity correction; resistivity measurements; sheet resistance; test structures; track necking effects; voltage taps; Biomedical optical imaging; Circuit testing; Electrical resistance measurement; Electronic equipment testing; Geometry; Immune system; Medical simulation; Resists; Solid modeling; Voltage;

fLanguage

English

Publisher

ieee

Conference_Titel

Microelectronic Test Structures, 1999. ICMTS 1999. Proceedings of the 1999 International Conference on

Conference_Location

Goteborg

Print_ISBN

0-7803-5270-X

Type

conf

DOI

10.1109/ICMTS.1999.766236

Filename

766236