DocumentCode :
2822024
Title :
Mixed system and component level T-CAD for micro fabrication
Author :
Hansen, U. ; Germer, C. ; Büttgenbach, S. ; Franke, H.-J.
Author_Institution :
Inst. for Microtechnol., TU Braunschweig, Germany
fYear :
2003
fDate :
5-7 May 2003
Firstpage :
4
Lastpage :
9
Abstract :
In this paper two T-CAD systems are presented, one dealing with the design of micro devices on the system level and allowing checking of process sequences using rules comprising expert knowledge. The other one is a work-flow-based system for the layout of micro components fabricated by wet chemical etching of silicon, thus providing a component level view to the design process. It is shown how both systems are integrated providing the designer with concurrent access to system and component design.
Keywords :
elemental semiconductors; etching; micromechanical devices; silicon; technology CAD (electronics); Si; T-CAD systems; micro devices; micro fabrication; mixed system; silicon; wet chemical etching; Assembly; Chemical processes; Design engineering; Fabrication; Knowledge engineering; Micromechanical devices; Process design; Shape; Silicon; Wet etching;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Design, Test, Integration and Packaging of MEMS/MOEMS 2003. Symposium on
Print_ISBN :
0-7803-7066-X
Type :
conf
DOI :
10.1109/DTIP.2003.1286999
Filename :
1286999
Link To Document :
بازگشت