DocumentCode
2822024
Title
Mixed system and component level T-CAD for micro fabrication
Author
Hansen, U. ; Germer, C. ; Büttgenbach, S. ; Franke, H.-J.
Author_Institution
Inst. for Microtechnol., TU Braunschweig, Germany
fYear
2003
fDate
5-7 May 2003
Firstpage
4
Lastpage
9
Abstract
In this paper two T-CAD systems are presented, one dealing with the design of micro devices on the system level and allowing checking of process sequences using rules comprising expert knowledge. The other one is a work-flow-based system for the layout of micro components fabricated by wet chemical etching of silicon, thus providing a component level view to the design process. It is shown how both systems are integrated providing the designer with concurrent access to system and component design.
Keywords
elemental semiconductors; etching; micromechanical devices; silicon; technology CAD (electronics); Si; T-CAD systems; micro devices; micro fabrication; mixed system; silicon; wet chemical etching; Assembly; Chemical processes; Design engineering; Fabrication; Knowledge engineering; Micromechanical devices; Process design; Shape; Silicon; Wet etching;
fLanguage
English
Publisher
ieee
Conference_Titel
Design, Test, Integration and Packaging of MEMS/MOEMS 2003. Symposium on
Print_ISBN
0-7803-7066-X
Type
conf
DOI
10.1109/DTIP.2003.1286999
Filename
1286999
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