• DocumentCode
    2822224
  • Title

    Terahertz imaging with CMOS/BiCMOS process technologies

  • Author

    Pfeiffer, Ullrich R. ; Öjefors, Erik

  • Author_Institution
    High-Freq. & Commun. Technol., Univ. of Wuppertal, Wuppertal, Germany
  • fYear
    2010
  • fDate
    14-16 Sept. 2010
  • Firstpage
    52
  • Lastpage
    60
  • Abstract
    Contrary to the common belief, silicon devices may very well operate beyond their cut-off frequency. The push towards terahertz frequencies, though, presents both challenges and opportunities for emerging applications. This paper summarizes recent attempts to use foundry-level silicon process technologies for the realization of terahertz electronic systems.
  • Keywords
    BiCMOS integrated circuits; CMOS integrated circuits; terahertz wave imaging; CMOS/BiCMOS process; cut-off frequency; silicon devices; terahertz electronic systems; terahertz imaging; CMOS integrated circuits; CMOS technology; Detectors; Imaging; Pixel; Receivers; Silicon;
  • fLanguage
    English
  • Publisher
    ieee
  • Conference_Titel
    ESSCIRC, 2010 Proceedings of the
  • Conference_Location
    Seville
  • ISSN
    1930-8833
  • Print_ISBN
    978-1-4244-6662-7
  • Type

    conf

  • DOI
    10.1109/ESSCIRC.2010.5619773
  • Filename
    5619773