Quantitative study of the ´M.E.M.S.N.A.S.´ process for 3D microfabrication using binary lithography

In this paper, we present the results of investigations on the quantitative characterization of the previously reported MEMSNAS process, which was developed for 3D microfabrication applications using binary lithography and isotropic etching. Such characterization results are indeed of interest for the purpose of developing design rules, which are intended to help for fast prototyping of arbitrary 3D structures with good shape accuracy. Among the characteristics that have been investigated, one can mention process calibration. It is obtained using simple test structures. Silicon 3D micromachining was investigated mainly with SF₆-based dry etching using both RIE and DRIE reactors. Wet etching with an HNA mixture was also used in some experiments. The MEMSNAS 3D micromachining method was successfully applied to glass as well.