DocumentCode :
2824581
Title :
High sensitivity 12 Gb/s monolithically integrated pin-HEMT photoreceivers
Author :
Fay, P. ; Adesida, I. ; Caneau, Catherine ; Chandrasekhar, S.
Author_Institution :
Dept. of Electr. Eng., Notre Dame Univ., IN, USA
fYear :
1998
fDate :
11-15 May 1998
Firstpage :
439
Lastpage :
442
Abstract :
The design, fabrication, and performance of a long-wavelength high-speed monolithically integrated photoreceiver suitable for receiving 12 Gb/s data is reported. The photoreceiver has been fabricated in a single growth run using lattice-matched materials on a planar InP substrate by organometallic vapor phase epitaxy (OMVPE). The circuit design employs a three-stage transimpedance preamplifier topology based on high electron mobility transistors (HEMTs) and a top-illuminated pin photodiode. The completed photoreceiver demonstrated an optoelectronic -3 dB bandwidth of 8.3 GHz, with an average input-referred noise current spectral density of 8.8 pA/Hz1/2. Bit error rate measurements of packaged photoreceivers showed a sensitivity (at a bit error ratio of 10-9 ) of -17.7 dBm at 10 Gb/s and -15.8 dBm at 12 Gb/s, for a 231 -1 pattern-length pseudorandom bitstream at a wavelength of 1.55 μm. To the author´s knowledge, this is the best directly-measured sensitivity for a HEMT-based integrated photoreceiver at these bitrates
Keywords :
MOCVD; error statistics; high electron mobility transistors; high-speed optical techniques; integrated optoelectronics; optical design techniques; optical fabrication; optical receivers; optical testing; p-i-n photodiodes; preamplifiers; sensitivity; vapour phase epitaxial growth; 1.55 mum; 10 Gbit/s; 12 Gbit/s; 8.3 GHz; HEMT-based integrated photoreceiver; InP; average input-referred noise current spectral density; bit error rate measurements; bit error ratio; bitrates; circuit design; design; directly-measured sensitivity; fabrication; high electron mobility transistors; lattice-matched materials; long-wavelength high-speed monolithically integrated photoreceiver; monolithically integrated pin-HEMT photoreceivers; optoelectronic bandwidth; organometallic vapor phase epitaxy; packaged photoreceivers; pattern-length pseudorandom bitstream; performance; photoreceiver; planar InP substrate; sensitivity; single growth run; three-stage transimpedance preamplifier topology; top-illuminated pin photodiode; Circuit synthesis; Circuit topology; Epitaxial growth; Fabrication; HEMTs; Indium phosphide; MODFETs; PIN photodiodes; Preamplifiers; Substrates;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Indium Phosphide and Related Materials, 1998 International Conference on
Conference_Location :
Tsukuba
ISSN :
1092-8669
Print_ISBN :
0-7803-4220-8
Type :
conf
DOI :
10.1109/ICIPRM.1998.712498
Filename :
712498
Link To Document :
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