Title :
The Near-Field Far-Field Transition in Interferometric Microscopy: Implications for Superresolution Approaches
Author :
Totzeck, M. ; Tiziani, H.J.
Author_Institution :
Institut Fur Technishe Optik, Universitat Stutgart, Pfaffenwaldring 9, D-70569 Stutgart, Germany
Keywords :
Charge carrier processes; Force measurement; Gray-scale; Nonlinear optics; Optical filters; Optical interferometry; Optical microscopy; Paints; Silicon; Springs;
Conference_Titel :
Lasers and Electro-optics Europe, 1996. CLEO/Europe., Conference on
Conference_Location :
Hamburg, Germany
Print_ISBN :
0-7803-3169-9
DOI :
10.1109/CLEOE.1996.562005
