DocumentCode
2828015
Title
Dissipative quantum transport in nanoscale transistors
Author
Guo, Jing
Author_Institution
Dept. of ECE, Univ. of Florida, Gainesville, FL, USA
fYear
2012
fDate
18-20 June 2012
Firstpage
229
Lastpage
230
Abstract
We review our efforts on using numerical simulations to study essential physics of dissipative quantum transport in nanoscale field-effect transistors (FETs). Three types of nanoscale transistors are modeled as examples, (i) graphene nanoribbon (GNR) FETs with a quasi-one-dimensional (1D) channel, (ii) graphene FETs with a two-dimensional channel, and (iii) tunneling FETs with a strained GNR channel. In a quasi-1D channel, inelastic phonon scattering can increase the ballisticity at high drain biases considerably and partly offset the negative effect due to elastic scattering. Interplay between dissipative scattering processes and quantum phenomena, such as Klein tunneling in a graphene FET and band-to-band tunneling in a tunneling FET, play an important role on device characteristics. Coupling between far-from-equilibrium phonons and electrons and transport in the strong electron-phonon coupling regime remain as issues for further study.
Keywords
electron-phonon interactions; field effect transistors; nanoelectronics; nanoribbons; Klein tunneling; band-to-band tunneling; dissipative quantum transport; dissipative scattering process; drain bias; elastic scattering; electron-phonon coupling; graphene nanoribbon FET; inelastic phonon scattering; nanoscale FET; nanoscale field-effect transistors; numerical simulations; quasi1D channel; quasione-dimensional channel; strained GNR channel; tunneling FET; two-dimensional channel; two-dimensional channel graphene FET; FETs; Nanoscale devices; Phonons; Scattering; Strain; Tunneling;
fLanguage
English
Publisher
ieee
Conference_Titel
Device Research Conference (DRC), 2012 70th Annual
Conference_Location
University Park, TX
ISSN
1548-3770
Print_ISBN
978-1-4673-1163-2
Type
conf
DOI
10.1109/DRC.2012.6256945
Filename
6256945
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