DocumentCode :
2830951
Title :
Explanation of Unusual Dependence of Gate-Drain Breakdown Voltage on Gate Potential in Submicron Mesfets
Author :
Buvaylik, E. ; Martynov, Y. ; Pogorelova, E.
Author_Institution :
FSUE RPC "Istok", Fryazino
Volume :
1
fYear :
2006
fDate :
Sept. 2006
Firstpage :
224
Lastpage :
225
Abstract :
Gate-drain breakdown voltage measurements for submicron MESFETs and HFETs reveal the dependence of this voltage on gate potential. This fact conflicts with the simple theory and with the same measurements carried out for silicon MESFETs. We attempt to overcome this conflict using MESFET, HFET numerical simulation
Keywords :
Schottky gate field effect transistors; electric potential; high electron mobility transistors; gate potential; gate-drain breakdown voltage measurement; high electron mobility transistor; metal semiconductor field effect transistor; numerical simulation; submicron HFET; submicron MESFET; Computer aided analysis; Gallium arsenide; MESFETs; Voltage;
fLanguage :
English
Publisher :
ieee
Conference_Titel :
Microwave and Telecommunication Technology, 2006. CriMiCO '06. 16th International Crimean Conference
Conference_Location :
Sevastopol, Crimea
Print_ISBN :
966-7968-92-8
Electronic_ISBN :
966-7968-92-8
Type :
conf
DOI :
10.1109/CRMICO.2006.256371
Filename :
4023676
Link To Document :
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